Summary
This Major Research Instrumentation (MRI) grant will enable the acquisition of a high-rate Atomic Layer Deposition (ALD) system for research, education, and semiconductor workforce development in the Northern Nevada region. ALD is a critical technology used to deposit thin film oxides and nitrides required for leading-edge devices in fields as diverse as semiconductors, quantum technology, mechanical engineering, chemistry, and biology. The ALD will be located in the new Davidson Foundation Cleanroom, which is a facility shared by researchers and students throughout Northern Nevada. It will be
